Ceramic ESC

Ceramic ESC

Ceramic ESC


POWEL Corporation:
C-602/E-1005, Digital Empire B/D 1, 16, Deogyong-daero, 1556beon-gil, Yeongtong-gu, Suwon-si, Gyeonggi-do, Korea.16690 Tel: 031-206-2612~3 / Fax : 031-206-2614

A key component that fixes the substrate to the lower electrode using the force of static electricity. When DC power is applied to the electrostatic chuck, opposite potentials are charged to the object, and forces attracting each other by the charged potential are generated

ESC is a component that fixes Wafer in semiconductor manufacturing equipment using electrostatic force, and is generally divided into Monopolar(Unipolar) and Bipolar types according to the number of electrodes, and is also divided into columb and Jonsen-Rahb types according to the size of dielectric layer resistivity

Characteristics of ESC

  • Low price
  • Quick dechucking
  • Buried helium tunnel
  • Alumina / Coulombic type
  • Low leakage current → Less damage to Device

ESC's field and application process

1. AIN ESC with Heater

Characteristics

  • Excellent temperature uniformity
  • Excellent uniformity of heater ingredients
  • Shaft bonding is possible
  • It has a wide range of temperatures and sufficient adsorption
  • Custom-made/heater design
  • No change over time due to deterioration of the electrode

Application: Semiconductor/PVD/etc

Size : 4'' ~ 12''

2. Pin - chuck

Characteristics

  • High precision polishing
  • Local flatness control
  • Wafer flatness control

Application : Semiconductor / Photo / etc

Size : 4'' ~ 12''

3. AI2O3 THERMAL SPRAYED ESC

Characteristics

  • The insulating layer is precisely formed
  • Competitive price
  • High durability

Application : Semiconductor / CVD / Etcher / etc

SIze : 4'' ~ 12''

4. AIN HEATER

Characteristics

  • Using AIN with high thermal conductivity
  • Excellent temperature uniformity
  • It has characteristic inspection facilities through IR cameras and TC wafers

Application : Semiconductor / CVD / etc

Size : 4'' ~ 12''